定义
一种基于自聚焦效应的,用于测量材料克尔非线性强度的方法。
Z扫描测量技术[1,2]通常用于测量光学材料的克尔非线性强度(即非线性折射率n2)。其原理是:将待测材料样品移动通过激光束的焦点,并在样品后面的某个地方测量光束半径(或光轴上强度)。由于自聚焦效应的作用,这些量会发生变化,从而可以得到光束半径(或光轴上强度)关于样品位置的函数。
如图1所示,是一种常见的Z扫描测量装置。如果非线性折射率为正,并且将样品置于焦点的后面,自聚焦效应将减小光束的发散,从而提高检测器的信号强度。如果样品被放置在焦前面,焦点将向左侧移动,并且聚焦后的强的光束发散将减小检测器的信号强度。从所测量的检测器信号强度对样品位置的函数关系可以计算出非线性折射率的大小。
图1 Z扫描测量实验装置图
测量通过光阑后的光强,并得出其与样品位置的关系即可计算得出非线性折射率n2。其中左上方的探测器常用于探测入射光强度。需要注意的是一些非线性吸收(例如双光子吸收)也可能会影响所测量的信号。不过,这可以通过额外记录全部的透射光束功率进行校正。
参考文献
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参阅:自聚焦、克尔效应、非线性折射率